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    Services > Engineering Applications > Atomic Layer Epitaxy Control System
 
 

A research oriented Atomic Layer Epitaxy Control System for IISc.

This project was for an ongoing research in IISc which involved experimentation with the procedure of Semiconductor doping. The aim of the research was to discover ideal conditions in which the doping process can be improved upon. The tests are carried on within a sealed enclosure through which various gases are pumped in different ratios and the reaction of these gases on the doping process is noted. The system controls the inflow and the volume of the gases as well as the flushing out of these gases from the experiment chamber. The software controls over 15 pumps that regulate the inflow of the various gases.














 
 
 
 
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